Formation and properties of thin films of Iron silicides on Si(111) surface: Ab Initio simulation
Formation and properties of thin films of Iron silicides on Si(111) surface: Ab Initio simulation
2012
Статьи в журналах
TECHNICAL PHYSICS LETTERS
MAIK NAUKA/INTERPERIODICA/SPRINGER, 233 SPRING ST, NEW YORK, NY 10013-1578 USA
Vol. 38, No. 3
0,565
1063-7850
I.A. Kuyanov, A.A. Alekseev, and A.V. Zotov. Formation and properties of thin films of Iron silicides on Si(111) surface: Ab Initio simulation. Tech.Phys.Lett., 2012, Vol. 38, No. 3, P.215-217