2019
Галкин Н. Г., Горошко Д. Л., Доценко С. А., Чусовитин Е. А., Шевлягин А. В., А.К. Гутаковский
The formation of iron silicide nanocrystals (NCs) and their embedding into monocrystalline silicon was studied. Solid phase epitaxy of 0.4 nm Fe at 630 °C resulted in formation of NCs consisted of β-FeSi2 and ε-FeSi phases. Annealing of NCs at 750 °C for 90 min led to transformation of β-FeSi2 and ε-FeSi into α-FeSi2. On the other hand, silicon layer growth over as-formed NCs, at the same temperature, resulted in formation of single phase NCs consisted of β-FeSi2. Silicon deposition rate proved to be the crucial point for a full embedding of NCs. The rate of 1 nm/min resulted in emersion of NCs to the surface during silicon overgrowth irrespective of Si cap layer thickness, while the rate of 8 nm/min led to the full embedding of β-FeSi2 NCs. Both incompletely and fully embedded β-FeSi2 NCs have epitaxial relationship and stress favorable for an indirect to direct band-gap transition at Y point
Материалы / тезисы конференций
SPIE conference proceedings
Chusovitin E. et al. Embedding of iron silicide nanocrystals into monocrystalline silicon: suppression of emersion effect //Asia-Pacific Conference on Fundamental Problems of Opto-and Microelectronics 2017. – International Society for Optics and Photonics, 2019. – Т. 11024. – С. 1102402.
Proc. SPIE 11024 (2017) 1102402
1996-756X
USA, Bellingham, SPIE
https://doi.org/10.1117/12.2314675