ИАПУ ДВО РАН

Growth of Fe3O4 Films on the Si(111) Surface Covered by a Thin SiO2 Layer


2011

Журнал технической физики, RSCI

Article

Technical Physics

USA: Pleiad. Publ.

2011. Vol. 56, N 10.

0.54

0044-4642

Balashev V.V., Korobtsov V.V., Pisarenko T.A., Chebotkevich L.A. Growth of Fe3O4 Films on the Si(111) Surface Covered by a Thin SiO2 Layer // Technical Physics, 2011, Vol. 56, No. 10, P. 1501–1507.

http://dx.doi.org/10.1134/S1063784211100033

TEPH_V56_N10_2011_p1501.pdf
JTP-81-11-122.pdf