Study of chitosan biopolymer as the resist for the submicron electronic lithography


2014

Вознесенский С. С., Кульчин Ю. Н., Непомнящий А. В.

Статьи в журналах

Solid State Phenomena

Switzerland. Zuerich: Trans Tech Publications Ltd

Vol. 213

рр 180-185

978-3-03785-970-4

S.S. Voznesenskiy, A.V. Nepomnyaschiy, Y.N. Kulchin. Study of chitosan biopolymer as the resist for the submicron electronic lithography. Solid State Phenomena,2014, Vol. 213, P.180-185